PRODUCTS

PESANA LAB Proprietary Systems

Equipment Sales & Customization

Ultra-High Sensitivity IPES Measurement System

A next-generation inverse photoemission spectroscopy system designed and currently developed for commercialization directly by PESANA LAB to overcome practical limitations in research fields.

Assembly OAP LEIPS System

System Specifications

  • Energy Resolution< 350 meV
  • Recommended Operating Pressure< 5 × 10⁻⁹ Torr
  • Photon DetectorPhotomultiplier Tube
    (PMT)
  • C₆₀ LUMO -1 peak156 CPS/μA

Performance (C₆₀ Data)

Ultra-High Sensitivity Photon Detection

Collects minute photon signals to the extreme through a uniquely designed OAP mirror optical system, shortening measurement time and maximizing the S/N ratio.

High-Stability Electron Gun System

Ensures high-resolution measurement and unwavering beam stability even during long-term continuous operation with a design that minimizes energy spread.

Low-Damage LEIPS Mode Support

Provides integrated support for a low-energy Near-UV detection mode specialized for measuring organic materials and sensitive 2D materials.

Custom UHV Chamber

We custom design and manufacture ultra-high vacuum (UHV) chambers to enable seamless integration with customers' existing analytical systems (XPS, UPS, etc.).